An innovation for prevention latchup,pseudo-latchup path method,has been put forward that is based on latchup effects of bulk-Si CMOS devices.
从体硅CMOS器件锁效应入手,提出了
锁
一种新方法—伪
锁路径法。
An innovation for prevention latchup,pseudo-latchup path method,has been put forward that is based on latchup effects of bulk-Si CMOS devices.
从体硅CMOS器件锁效应入手,提出了
锁
一种新方法—伪
锁路径法。
95 Abstract With the rapid development of the IC manufacture, the critical dimension(CD) of the manufacturable CMOS technology has been put into 90nm, even 65nm and below from 130nm.
摘 要 随着IC造技术
快速发展,可量产
CMOS技术,其特征线宽也由0.13um 进入了90nm甚
65nm
下。
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