The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二
化硅具有微米亚微米纳米
。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二
化硅具有微米亚微米纳米
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
化是以高纯
蒸
为
化气氛,由硅片表面的硅原子和
分子反应生成二
化硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧是以高纯水蒸汽为氧
气氛,由
片表面的
原子和水分子反应生成二氧
。
明:以上例句、词性分类均由互
网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧是以高纯水蒸汽为氧
气氛,由
片表面的
原子和水分子反应生成二氧
。
明:以上例句、词性分类均由互
网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
过电镜实验,观察到
合二氧化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽氧化是以高纯
蒸汽为氧化气氛,由硅片表面的硅原
和
反应生成二氧化硅。
声明:以上例、词性
类均由互联网资源自动生成,部
未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅具有微米亚微米纳米三次结。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧化是高纯水蒸汽为氧化气氛,由硅片表面的硅原子和水分子
应生成二氧化硅。
:
上例句、词性分类均由互
网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二氧化硅具有微米亚微米纳米三
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
氧化是以高纯
蒸
为氧化气氛,由硅片表面的硅原子和
分子反应生成二氧化硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电,观察到水合二氧化
具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧化是以高纯水蒸汽为氧化气氛,由片表面
子和水分子反应生成二氧化
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽是以高纯水蒸汽为
气氛,由
片表面的
原子和水分子反应生成二
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅具有微米亚微米纳米三次结。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧化是以高纯水蒸汽为氧化气氛,由硅片表面的硅原子和水分子反应生成二氧化硅。
声明:以上例句、词性分类均由互联自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。