A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提出了一种基于二维器件深亚微米工艺外延
衬底
电阻宏
。
A resistance macromodel for deep-submicron process epi-type substrate based on the 2D device simulation is presented.
摘要提出了一种基于二维器件深亚微米工艺外延
衬底
电阻宏
。
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